Gas-assisted focused electron beam and ion beam processing and fabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 4, 2008, Pages 1197-1276

  Utke, Ivo ^a   Hoffmann, Patrik ^b   Melngailis, John ^c  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

^c UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC-LEVEL MECHANISMS; BEAM DIAMETERS; DEPOSITION PROCESSING; DIRECT FABRICATION; ELECTRON BEAM FABRICATION; FOCUSED ELECTRON BEAMS; ION-BEAM PROCESSING; MASK REPAIR; MATERIAL REMOVALS; NANO METER RANGE; NANO-FABRICATION; PRECURSOR GASES; PROCESSING CAPABILITIES; STATE OF THE ARTS; UNSOLVED PROBLEMS;

ATOMS; ELECTROLYSIS; ELECTRON BEAMS; ELECTRON GUNS; ELECTRON OPTICS; ELECTRONS; GASES; INDUSTRIAL RESEARCH; ION BOMBARDMENT; LITHOGRAPHY; MAINTENANCE; OPTICAL DESIGN; PARTICLE BEAMS; PHOTOMASKS; REPAIR; SPUTTER DEPOSITION;

IONS;

EID: 49749114396     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2955728     Document Type: Article

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