Three-dimensional nanoimprint mold fabrication by focused-ion-beam chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3874-3876

  Morita, Takahiko ^a,e   Watanabe, Keiichiro ^a,e   Kometani, Reo ^a,e   Kanda, Kazuhiro ^a,e   Haruyama, Yuichi ^a,e   Kaito, Takashi ^b   Fujita, Jun Ichi ^c,e   Ishida, Masahiko ^c,e   Ochiai, Yukinori ^c,e   Tajima, Tsutomu ^d   Matsui, Shinji ^a,e  

^a UNIVERSITY OF HYOGO   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

^c NEC CORPORATION   (Japan)

^d Crestec Corp   (Japan)

^e JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Chemical vapor deposition (CVD); Diamond like carbon (DLC); Electron beam (EB); Focused ion beam (FIB); Hydrogen silsequioxane (HSQ); Mold; Nanoimprint; Nanoimprint lithography (NIL)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ION BEAMS; MICROSTRUCTURE; PHOTOLITHOGRAPHY;

NANOIMPRINT LITHOGRAPHY (NIL);

DIAMOND LIKE CARBON FILMS;

EID: 12444311792     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3874     Document Type: Conference Paper

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