One nanometer structure fabrication using electron beam induced deposition

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1468-1470

  van Dorp, W F ^a   Hagen, C W ^a   Crozier, P A ^b   van Someren, B ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

Electron beam induced deposition; Electron microscope; Nanolithography; Nanostructures

Indexed keywords

ATOMS; ELECTRON MICROSCOPES; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; STATISTICAL METHODS; TUNGSTEN;

ELECTRON BEAM INDUCED DEPOSITION; ELECTRON MICROSCOPE; NANOLITHOGRAPHY;

ELECTRON BEAMS;

EID: 33646037036     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.155     Document Type: Article

References (8)

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8. W.F. van Dorp, B. van Someren, C.W. Hagen, P. Kruit, P.A. Crozier, J. Vac. Sci. Technol. B (2006) accepted for publication.