Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 401-404

  Brugger, J ^a   Beljakovic, G ^b   Despont, M ^a   De Rooij, N F ^b   Vettiger, P ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ION BEAMS; ION IMPLANTATION; POTASSIUM COMPOUNDS; SEMICONDUCTING GALLIUM; SILICON WAFERS; SURFACE TREATMENT;

DIRECT WRITE PATTERNING; FOCUSED ION BEAM; POTASSIUM HYDROXIDE; WET CHEMICAL ETCHING;

NANOTECHNOLOGY;

EID: 0031073649     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00210-9     Document Type: Article

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