Level set approach for the simulation of focused ion beam processing on the micro/nano scale

Nanotechnology

Volumn 18, Issue 26, 2007, Pages

  Kim, Heung Bae ^a   Hobler, Gerhard ^a   Steiger, Andreas ^a   Lugstein, Alois ^a   Bertagnolli, Emmerich ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; DEPOSITION; ETCHING; FOCUSED ION BEAMS; PHOTOLITHOGRAPHY; SURFACE TOPOGRAPHY;

MOVING INTERFACES; RE-DEPOSITION FLUXES; SEMICONDUCTOR MANUFACTURING;

NANOTECHNOLOGY;

ARTICLE; COATED PARTICLE; MATERIAL COATING; MOLECULAR MODEL; NANOANALYSIS; NANOARRAY; PREDICTION; PRIORITY JOURNAL; PROCESS DESIGN; SEMICONDUCTOR; SIMULATION;

EID: 34250216705     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/26/265307     Document Type: Article

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