A review of ion projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 927-957

  Melngailis, J ^a   Mondelli, A A ^b   Berry III, Ivan L ^c,e   Mohondro, R ^d  

^a UNIVERSITY OF MARYLAND   (United States)

^b SCIENCE APPLICATIONS INTERNATIONAL CORPORATION   (United States)

^c Microelectronics Research Laboratory   (United States)

^d Advanced Lithography Group   (United States)

^e Eaton Semiconduct Equip Operations   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001429835     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590052     Document Type: Review

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