Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3920-3923

  Lipp, S ^a   Frey, L ^b   Lehrer, C ^a   Frank, B ^a   Demm, E ^c   Pauthner, S ^c   Ryssel, H ^a,b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000353753     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588695     Document Type: Article

References (11)

1. T. Tao, W. Wilkinson, and J. Melngailis, J. Vac. Sci. Technol. B 9, 162
2. H. Schaffer and B. Breithaupt, Microelectron. Eng. 13, 275 (1991).
3. H. Komano, Y. Ogawa, and T. Takigawa, Jpn. J. Appl. Phys. 28, 2372 (1989)
4. R. Young and J. Puretz, J. Vac. Sci. Technol. B 13, 2576 (1996).
5. J. R. Baker, ISTFA '96 (unpublished), p. 43.
6. Ogasawara, M. Kariya, H. Nakamura, H. Komano, S. Inoue, K. Sugihara N. Hayasaka, K. Horioka, T. Takigawa, H. Okano, I. Mori, Y. Yamazaki, M. Miyoshi, T. Watanabe, and K. Okumura, Appl. Phys. Lett. 68, 732 (1996).
7. H.-C. Petzold and P. J. Heard, J. Vac. Sci. Technol. B 9, 2664 (1991).
8. S. Lipp, Ph.D. thesis, Universität Erlangen-Nürnberg, 1996.
9. R. R. Kunz and T. M. Mayer, Appl. Phys. Lett. 50, 962 (1987).
10. S. Lipp, L. Frey, C. Lehrer, E. Demm, S. Pauthner, and H. Ryssel (accepted at ESREF '96).
11. K. Kanaya and S. Ono, Electron Beam Interaction with Solids (SEM Inc., AMF O'Hare, 1983), p. 69.