Real-time reflectometry-controlled focused-electron-beam-induced deposition of transparent materials

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 587-591

  Perentes, A ^a   Bret, T ^a   Utke, I ^a   Hoffmann, P ^a   Vaupel, M ^b  

^a EPFL   (Switzerland)

^b Nanofilm Technologie GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON BEAMS; LASERS; LIGHT REFLECTION; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

FOCUSED-ELECTRON-BEAM (FEB); PERIODIC INTENSITY VARIATIONS; PERIODIC SIGNAL;

REFLECTOMETERS;

EID: 33645522794     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2170096     Document Type: Article

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