Nanoscale electron stimulated chemical vapor deposition of Au in an environmental transmission electron microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2403-2408

  Ketharanathan, Sutharsan ^a   Sharma, Renu ^a   Drucker, Jeff ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON STIMULATION; NANOSCALE ELECTRONS; PRECURSORS; REAL-TIME COMPOSITION;

ADSORPTION; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; NANOTECHNOLOGY; SECONDARY EMISSION; TRANSMISSION ELECTRON MICROSCOPY;

GOLD;

EID: 29044432180     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2122847     Document Type: Article

References (25)

1. E. E. Ehrichs, S. Yoon, and A. L. de Lozanne, Appl. Phys. Lett. 53, 2287 (1988).
2. A. de Lozanne, Jpn. J. Appl. Phys., Part 1 33, 7090 (1994).
3. H. W. P. Koops, J. Kretz, M. Rudolph, M. Weber, G. Dahm, and K. L. Lee, Jpn. J. Appl. Phys., Part 1 33, 7099 (1994).
4. A. Folch, J. Tajeda, C. H. Peters, and M. S. Wrighton, Appl. Phys. Lett. 66, 2080 (1995).
5. M. Tanaka, M. Shimojo, K. Matsuishi, and K. Furuya, Appl. Phys. A: Mater. Sci. Process. 78, 543 (2004).
6. Z. Q. Liu, K. Mitsuishi, and K. Furuya, J. Appl. Phys. 96, 3983 (2004).
7. A. D. Dubner, A. Wagner, J. Melngailis, and C. V. Thompson, J. Appl. Phys. 70, 665 (1991).
8. S. Matsui and T. Ichihashi, Appl. Phys. Lett. 53, 842 (1988).
9. R. L. Kubena, F. P. Stratton, and T. M. Mayer, J. Vac. Sci. Technol. B 6, 1865 (1988).
10. R. Sharma and K. Weiss, Microsc. Res. Tech. 42, 270 (1998).
11. H. Uchida, N. Saitou, M. Satou, M. Tebakari, and K. Ogi, Mater. Res. Soc. Symp. Proc. 334, 293 (1994).
12. K. Holloway, S. P. Zuhoski, S. Reynolds, and C. Matuszewski, Mater. Res. Soc. Symp. Proc. 204, 409 (1991).
13. R. Sharma, P. A. Crozier, R. Marx, and K. Weiss, Microsc. Microanal. 9, 912 (2003).
14. C. E. Larson, T. H. Baum, and R. L. Jackson, J. Electrochem. Soc. 134, 266 (1987).
15. T. H. Baum, J. Electrochem. Soc. 134, 2616 (1987).
16. Structure Probe Inc. 〈 www.2spi.com 〉
17. S. Ketharanathan, R. Sharma, P. Crozier, and J. Drucker (submitted).
18. S. J. Pennycook, S. D. Berger, and R. J. Culbertson, J. Microsc. 144, 229 (1986).
19. N. Silvis-Cividjian, C. W. Hagen, P. Kruit, M. A. J. v. d. Stam, and H. B. Groen, Appl. Phys. Lett. 82, 3514 (2003).
20. N. Silvis-Cividjian, C. W. Hagen, L. H. A. Leunissen, and P. Kruit, Microelectron. Eng. 61-62, 693 (2002).
21. C. J. Powell, Scan Electron Microsc. 4, 1649 (1984).
22. L. Reimer, Scanning Electron Microscopy (Springer, Berlin, 1990), pp. 143-147.
23. S. Matsui and K. Mori, Jpn. J. Appl. Phys., Part 2 23, L706 (1984).
24. H. W. P. Koops, R. Weiel, D. P. Kern, and T. H. Baum, J. Vac. Sci. Technol. B 6, 477 (1988).
25. K. L. Lee and M. Hatzakis, J. Vac. Sci. Technol. B 7, 1941 (1989).