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Volumn 17, Issue 11, 2006, Pages 2722-2729

Interdigitated 50 nm Ti electrode arrays fabricated using XeF2 enhanced focused ion beam etching

(4) Santschi, Ch a,b Jenke, M b Hoffmann, P b Brugger, J a

a Station 17 (Switzerland)

b EPFL (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ARRAYS; ELECTROCHEMICAL ELECTRODES; ETCHING; FOCUSING; ION BEAMS;

FOCUSED ION BEAM (FIB); ION MILLING; NANOELECTRODES; XEF2 GAS ASSISTANCE;

TITANIUM;

EID: 33744552753 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/17/11/002 Document Type: Article

Times cited : (44)

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