Exploration of the ultimate patterning potential achievable with focused ion beams

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 266-278

  Gierak, J ^a   Bourhis, E ^a   Merat Combes M N ^a   Chriqui, Y ^a   Sagnes, I ^a   Mailly, D ^a   Hawkes, P ^b   Jede, R ^c   Bruchhaus, L ^c   Bardotti, L ^d   Prevel B ^d   Hannour, A ^d   Melinon P ^d   Perez, A ^d   Ferre J ^e   Jamet, J P ^e   Mougin, A ^e   Chappert, C ^f   Mathet, V ^f  

^a UNIV PARIS SUD   (France)

^b CEMES CNRS   (France)

^c RAITH GmbH   (Germany)

^d University of Lyon   (France)

^e UNIVERSITÉ PARIS SUD   (France)

^f UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; GALLIUM; INTEGRATED CIRCUITS; MAGNETIC FILMS; NANOSTRUCTURED MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSSED ION BEAM (FIB); GRAPHITE CRYSTALLINE SURFACE; NEXT GENERATION LITHOGRAPHIES (NGL); ULTRATHIN MAGNETIC FILMS;

ION BEAMS;

EID: 20244363742     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.038     Document Type: Conference Paper

References (27)

1. International semiconductor roadmap for semiconductors 〈http://www.public.itrs.net〉, 2003 (edition)
2. R.P. Feynman, There's Plenty of Room at the Bottom - An Invitation to Enter a New Field of Physics, 1959, Caltech's - Available from: 〈http://www.zyvex.com/nanotech/feynman.html〉
3. S. Matsui, and Y. Ochiai Nanotechnology 7 1996 247
4. J. Orloff, Mark Utlaut, and L. Swanson High-resolution focused ion beams 2003 Kluwer Academic Dordrecht
5. F. Laruelle, Y.P. Hu, R. Simes, W. Robinson, J. Merz, and P.M. Petroff Surf. Sci. 228 1990 306
6. T. Yamamoto, J. Yanagisawa, K. Gamo, S. Takaoka, and K. Murase Jpn. J. Appl. Phys. 32 1993 6268
7. J. Gierak, G. Ben Assayag, M. Schneider, C. Vieu, and J.Y. Marzin Microelectron. Eng. 30 1-4 1996 253
8. R. Forbes Vacuum 48 1997 85
9. J.J. Van Es, J. Gierak, R.G. Forbes, V.G. Suvorov, T. Vanden Berghe, Ph. Dubuisson, I. Monnet, and A. Septier Microelectron. Eng. 73-74 2004 132
10. B. Lencova J. Orloff Handbook of Charged Particle Optics 1997 CRC Press Boca Raton
11. V.A. Zworykin Electron Optics and the Electron Microscope 1945 Wiley New York pp. 600-601
12. N. Rau, F. Stratton, C. Fields, T. Ogawa, A. Neureuther, R. Kubena, and G. Willson J. Vac. Sci. Technol. B 16 1998 3784
13. J. Gierak, Y. Lagadec, A. Septier, Patent Device for generating an Ion Beam, WO 02/078036A2, US 2004/0094725A1
14. P.N. Favennec, L'implantation Ionique, Masson Editor, 1993
15. J. Lohau, A. Moser, C.T. Rettner, M.E. Best, and B.D. Terris Appl. Phys. Lett. 78 2001 990
16. A.O. Orlov, I. Amlani, G.H. Bernstein, C.S. Lent, and G.L. Snider Science 277 1997 928
17. S. Sun, C.B. Murray, D. Weller, L. Folsk, and A. Moser Science 287 2000 1989
18. R.P Andres, T. Bein, M. Dorogi, S. Feng, J.I. Henderson, C.P. Kubiak, W. Mahoney, R.G. Osifchin, and R. Reifenberger Science 272 1996 1323
19. M. Negrier, J. Tuaillon-Combes, V. Dupuis, A. Perez, M. Pellarin, and M. Broyer Eur. Phys. J D9 2000 475
20. C. Chappert, H. Bernas, J. Ferré, V. Kottler, J.P. Jamet, Y. Chen, E. Cambril, T. Devolder, F. Rousseaux, V. Mathet, and H. Launois Science 280 1998 1919
21. T. Aign, P. Meyer, S. Lemerle, J.P. Jamet, V. Mathet, C. Chappert, J. Gierak, C. Vieu, F. Rousseaux, H. Launois, and H. Bernas Phys. Rev. Lett. 81 1998 5656
22. J.P. Jamet, J. Ferré, P. Meyer, J. Gierak, C. Vieu, F. Rousseaux, C. Chappert, and V. Mathet IEEE Trans. Magn. 37 2001 2120
23. J.F. Ziegler Handbook of Ion Implantation Technology 1992 North Holland Amsterdam
24. D.A. Allwood Science 296 2002 2003
25. J.P. Jamet, J. Ferré, J. Gierak, C. Vieu, F. Rousseaux, C. Chappert, V. Mathet, and T. Devolder IEEE Trans Magn. 37 2001 2120
26. L. Bardotti, B. Prevel, M. Treilleux, P. Mélinon, and A. Perez Appl. Surf. Sci. 164 2000 52
27. L. Bardotti et al., to be published