Ion-induced chemical vapor deposition of high purity Cu films at room temperature using a microwave discharge H atom beam source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2677-2686

  Chiang, T P ^a   Sawin, H H ^a   Thompson, C V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031514491     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580942     Document Type: Article

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