A review of focused ion beam applications in microsystem technology

Journal of Micromechanics and Microengineering

Volumn 11, Issue 4, 2001, Pages 287-300

  Reyntjens, S ^a   Puers, R ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FABRICATION; FAILURE ANALYSIS; MAGNETORESISTANCE; MICROMACHINING; SEMICONDUCTING SILICON; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAMS (FIB);

ION BEAMS;

EID: 0035396298     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/11/4/301     Document Type: Review

References (31)

1. Critical review: Focused ion beam technology and applications
2. Focused ion beam deposition of new materials: Dielectric films for device modification and mask repair, and Ta films for x-ray mask repair
3. Focused ion beam as an inspection tool for microsystem technology
4. Microcircuit modification using focused ion beams
5. Focused ion beam technology for integrated circuit modification
6. Focused ion beam induced tungsten deposition for repair of clear defects on x-ray masks
7. Focused ion beam sample preparation for TEM
8. Focused ion beam system for automated MEMS prototyping and processing
9. A microaccelerometer structure fabricated in silicon-on-insulator using a focused ion beam process
10. Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
11. Microprocessing at the fingertips
12. Microfabrication of three-dimensional boron structures by laser chemical processing
13. Model for focused ion beam deposition
14. Selective area nucleation for metal chemical vapor deposition using focused ion beams
15. Focused ion beam fabrication of submicron gold structures
16. Ion beams focus on semiconductor devices
17. Electrodeposited copper inductors for intraocular pressure telemetry
18. Synchronisation and collective behaviour in a network of non-linear resonators: A new approach to redundant sensing
19. Microstereolithography using a dynamic mask generator and a non-cohorent visible light source
20. Investigation of micro-EDM for silicon microstructure fabrication
21. Focused ion beam processing for microscale fabrication
22. Micro-machining using a focused ion beam
23. Fabrication and testing of custom vacuum encapsulations deposited by focused ion beam direct-write CVD
24. Writing FIB implantation and subsequent anisotropic wet chemical etching for fabrication of 3D structures in silicon
25. Proper sample preparation improves TEM performance
26. Ethylene diamine-pyrocatechol-water mixture shows etching anomaly in boron-doped silicon
27. Focused ion beam induced deposition: Fabrication of three-dimensional microstructures and Young's modulus of the deposited material