Electron beam induced deposition from W(CO)6 at 2 to 20 keV and its applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 662-673

  Hoyle, P C ^a   Cleaver, J R A ^a   Ahmed, H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000094364     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589154     Document Type: Article

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