Conditions for fabrication of highly conductive wires by electron-beam-induced deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 7135-7139

  Hiroshima, Hiroshi ^a   Suzuki, Norihito ^b   Ogawa, Naomi ^b   Komuro, Masanori ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Electron beam lithography; Electron beam induced deposition; Nanofabrication; WF6

Indexed keywords

ANNEALING; CONTAMINATION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC WIRE; ELECTRODEPOSITION; ELECTRON BEAM LITHOGRAPHY;

ELECTRON-BEAM-INDUCED DEPOSITION (EBID); HIGHLY CONDUCTIVE WIRES;

NANOTECHNOLOGY;

EID: 0033356187     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7135     Document Type: Article

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