Sub-5 nm FIB direct patterning of nanodevices

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 779-783

  Gierak, J ^a   Madouri, A ^a   Biance, A L ^a,b   Bourhis, E ^a   Patriarche, G ^a   Ulysse, C ^a   Lucot, D ^a   Lafosse, X ^a   Auvray, L ^b   Bruchhaus, L ^c   Jede, R ^c  

^a UNIV PARIS SUD   (France)

^b UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^c RAITH GmbH   (Germany)

Author keywords

Focused ion beam; Quantum dots; Selective epitaxy

Indexed keywords

FOCUSED ION BEAMS; ION SOURCES; MEMBRANES; OPTIMIZATION; SEMICONDUCTOR QUANTUM DOTS;

IONS PASS; NANODEVICES FABRICATION; SELECTIVE EPITAXY; THIN FOILS;

NANOPORES;

EID: 34247551279     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.059     Document Type: Article

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