Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6791-6797

  Luxmoore, I J ^a   Ross, I M ^a   Cullis, A G ^a   Fry, P W ^a   Orr, J ^b   Buckle, P D ^b   Jefferson, J H ^b  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b QINETIQ   (United Kingdom)

Author keywords

Chemical vapour deposition; Electrical properties and measurements; Nano structures; Transmission electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; ELECTRON BEAMS; ION BEAMS; LOW TEMPERATURE EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

ELECTRON BEAM DEPOSITED WIRES; ELECTRON DOSES; HOPPING CONDUCTION MECHANISM;

NANOWIRES;

EID: 34247554873     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.029     Document Type: Article

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