Operation of high power field emitters fabricated with electron beam deposition and concept of a miniaturised free electron laser

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 1009-1016

  Floreani, F ^a   Koops, H W ^b   Elsaßer W ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b DEUTSCHE TELEKOM LABORATORIES   (Germany)

Author keywords

Additive nano lithography; Field electron emitter; Free electron laser; Smith Purcell effect; Vacuum microelectronics

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FREE ELECTRON LASERS; NEGATIVE TEMPERATURE COEFFICIENT;

FIELD ELECTRON EMITTERS;

ELECTRON EMISSION;

EID: 0035450061     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00567-6     Document Type: Article

References (17)

1. Use of S-K chart for evaluation of work function