Electron induced deposition and in situ etching of CrO x Cl y films

Applied Surface Science

Volumn 249, Issue 1-4, 2005, Pages 110-114

  Wang, S ^a   Sun, Y M ^a   White, J M ^a  

^a The University of Texas at Austin   (United States)

Author keywords

AES; CrO x Cl y films; Electron beam induced deposition (EBID)

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHROMIUM COMPOUNDS; ELECTRON BEAMS; ELECTRON IRRADIATION; ETCHING; PRESSURE EFFECTS; SPUTTER DEPOSITION; THERMAL EXPANSION;

AES; CROXCLY FILMS; ELECTRON BEAM INDUCED DEPOSITION (EBID); ELECTRON-INDUCED SURFACE CHEMICAL REACTIONS;

SURFACE CHEMISTRY;

EID: 21244454450     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.11.060     Document Type: Article

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