Focused-electron-beam-induced deposition of freestanding three-dimensional nanostructures of pure coalesced copper crystals

Applied Physics Letters

Volumn 81, Issue 17, 2002, Pages 3245-3247

  Utke, I ^a   Luisier, A ^a   Hoffmann, P ^a   Laub, D ^a   Buffat, P A ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATRICES; COPPER CRYSTALS; DIRECT WRITING; FOCUSED ELECTRON BEAMS; METAL ORGANIC PRECURSORS; THERMAL DECOMPOSITION PROCESS; THREE-DIMENSIONAL NANOSTRUCTURES;

AMORPHOUS CARBON; DEPOSITION RATES; ELECTRON BEAMS; FLUORINE; NANOCRYSTALS; PYROLYSIS; THREE DIMENSIONAL;

AMORPHOUS SILICON;

EID: 79956037527     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1517180     Document Type: Article

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