Focused electron beam induced deposition of a periodic transparent nano-optic pattern

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 412-416

  Perentes, A ^a   Bachmann, A ^a   Leutenegger, M ^a   Utke, I ^a   Sandu, C ^a   Hoffmann, P ^a  

^a EPFL   (Switzerland)

Author keywords

Focused electron beam induced deposition; Photonic band gap; Spectroscopic micro ellipsometry; Transparent substrate

Indexed keywords

DEPOSITION; DIELECTRIC MATERIALS; ELLIPSOMETRY; FABRICATION; PHOTONS; REFRACTIVE INDEX; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ELECTRON BEAM INDUCED DEPOSITION; PHOTONIC BAND GAP; SPECTROSCOPIC MICRO-ELLIPSOMETRY; TRASPARENT SUBSTRATE;

ELECTRON BEAMS;

EID: 2542421340     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00146-7     Document Type: Conference Paper

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