In situ control of the focused-electron-beam-induced deposition process

Applied Physics Letters

Volumn 83, Issue 19, 2003, Pages 4005-4007

  Bret, T ^a   Utke, I ^a   Bachmann, A ^a   Hoffmann, P ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; COMPUTER SIMULATION; DEPOSITION; ELECTRON EMISSION; ETCHING; ION BEAMS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; VAPORS;

CHARGED-PARTICLE DEPOSITION; ELECTRON BACKSCATTERING;

ELECTRON BEAMS;

EID: 0345376737     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1626261     Document Type: Article

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