The size dependence of the nano-dots formed by electron-beam-induced deposition on the partial pressure of the precursor

Applied Physics A: Materials Science and Processing

Volumn 78, Issue 4, 2004, Pages 543-546

  Tanaka, M ^a   Shimojo, M ^a,b   Mitsuishi, K ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM PUMPING; ELECTRON BEAMS; ELECTRON IRRADIATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR QUANTUM DOTS; SIZE DETERMINATION; TRANSMISSION ELECTRON MICROSCOPY;

DOT SIZE; ELECTRON-BEAM INDUCED DEPOSITION (EBID);

TUNGSTEN;

EID: 1242352493     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2394-z     Document Type: Article

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