Formation of crystalline Si nanodots in Sio2 films by electron irradiation

Applied Physics Letters

Volumn 82, Issue 7, 2003, Pages 1108-1110

  Du, Xi Wen ^a   Takeguchi, Masaki ^a   Tanaka, Miyoko ^a   Furuya, Kazuo ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; CRYSTALLIZATION; ELECTRON IRRADIATION; IONIZATION; NANOSTRUCTURED MATERIALS;

VALENCE ELECTRONS;

AMORPHOUS SILICON;

EID: 0037450207     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1555691     Document Type: Article

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