Evaluation of field electron emitter fabricated using focused-ion-beam chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 24-28, 2006, Pages

  Kometani, Reo ^a,b,c   Kanda, Kazuhiro ^a,b   Haruyama, Yuichi ^a,b   Kaito, Takashi ^d   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c JAPAN SOCIETY FOR THE PROMOTION OF SCIENCE   (Japan)

^d SII NANOTECHNOLOGY INC   (Japan)

Author keywords

Diamond like carbon (DLC); Field electron emitter; Focused ion beam chemical vapor deposition (FIB CVD); Nano tool; Three dimensional (3 D) structure

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; GLASS; PHOTOELECTRON SPECTROSCOPY; THRESHOLD VOLTAGE;

DIAMOND-LIKE CARBON (DLC); FIELD ELECTRON EMITTER; FOCUSED-ION-BEAM CHEMICAL VAPOR DEPOSITION (FIB-CVD); NANO-TOOL; THREE-DIMENSIONAL (3-D) STRUCTURE;

ELECTRON EMISSION;

EID: 33746303582     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L711     Document Type: Article

References (15)

1. S. Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda and Y. Haruyama: J. Vac. Sci. Technol. B 18 (2000) 3181.
2. R. Kometani, T. Hoshino, K. Kondo, K. Kanda, Y. Harayaraa, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai and S. Matsui: J. Vac. Sci. Technol. B 23 (2005) 298.
3. L. Dong, F. Arai and T. Fukuda: Appl. Phys. Lett. 81 (2002) 1919.
4. F. Floreani, H. W. Koops and W. Elsäßer: Microelectron. Eng. 57-58 (2001) 1009.
5. X. Yang, M. L. Simpson, S. J. Randolph, P. D. Racka, L. R. Baylor, H. Cui and W. L. Gardner: Appl. Phys. Lett. 86 (2005) 183106.
6. J. Fujita, M. Ishida, T. Ichihashi, T. Sakaraoto, Y. Ochiai, T. Kaito and S. Matsui: Jpn. J. Appl. Phys. 41 (2002) 4423.
7. T. Hoshino, K. Watanabe, R. Kometani, T. Monta, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai and S. Matsui: J. Vac. Sci. Technol. B 21 (2003) 2732.
8. P. Althainz, U. Myler and K. Jacobi: Phys. Rev. B 41 (1990) 2849.
9. T. C. Leung, C. L. Kao, W. S. Su, Y. J. Feng and C. T. Chan; Phys. Rev. B 68 (2003) 195408.
10. C. J. Fall, N. Binggeli and A. Baldereschi: Phys. Rev. B 65 (2001) 045401.
11. H. Nakane, S. Satoh and H. Adachi: J. Vac. Sci. Technol. B 23 (2005) 769.
12. Y. Toda, S. W. Kim, K. Hayashi, M. Hirano, T. Kamiya, H. Hosono, T. Haraguchi and H. Yasuda: Appl. Phys. Lett. 87 (2005) 254103.
13. N. de Jonge, M. Allioux, J. T. Oostveen, K. B. K. Teo and W. T. Milne: Phys. Rev. Lett. 94 (2005) 186807.
14. Z. Xu, X. D. Bai, E. G. Wang and Z. L. Wang: Appl. Phys. Lett. 87 (2005) 163106.
15. J. C. She, K. Zhao, S. Z. Deng, J. Chen and N. S. Xu: Appl. Phys. Lett. 87 (2005) 052105.