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Volumn 4, Issue 6, 2008, Pages 841-846

Electron-beam-induced deposition in ultrahigh vacuum: Lithographic fabrication of clean iron nanostructures

(4) Lukasczyk, Thomas a Schirmer, Michael a Steinrück, Hans Peter a Marbach, Hubertus a

a UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

Electron microscopy; Iron; Nanolithography; Nanostructures; Secondary electrons

Indexed keywords

DEPOSITS; IRON; NANOSTRUCTURES; NANOTECHNOLOGY; OPTICAL DESIGN; PIEZOELECTRIC ACTUATORS; SILICON; ULTRAHIGH VACUUM; VACUUM; VACUUM TECHNOLOGY;

ARBITRARY SHAPES; CHEMICAL COMPOSITIONS; DIFFUSIVE PROCESSES; ELECTRON BEAM-INDUCED DEPOSITION (EBID); LITHOGRAPHIC FABRICATION; MASKLESS NANOFABRICATION; REDUCED SIZE; SI(1 0 0 ); ULTRAHIGH-VACUUM CONDITIONS;

VACUUM DEPOSITION;

IRON; NANOMATERIAL;

ARTICLE; CHEMISTRY; ELECTRON; SCANNING ELECTRON MICROSCOPY; VACUUM;

ELECTRONS; IRON; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; VACUUM;

EID: 47549086739 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200701095 Document Type: Article

Times cited : (91)

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