Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2737-2741

  Morita, Takahiko ^a,b   Kometani, Reo ^a,b   Watanabe, Kelichiro ^a,b   Kanda, Kazuhiro ^a,b   Haruyama, Yuichi ^a,b   Hoshino, Takayuki ^b   Kondo, Kazushige ^b   Kaito, Takashi ^c   Ichihashi, Toshinari ^b,d   Fujita, Jun Ichi ^b,d   Ishida, Masahiko ^b,d   Ochiai, Yukinori ^b,d   Tajima, Tsutomu ^e   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c SEIKO INSTRUMENTS INC   (Japan)

^d NEC CORPORATION   (Japan)

^e Crestec Corp   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; COMPUTER CONTROL; ELECTROCHEMICAL ELECTRODES; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; ENERGY DISPERSIVE SPECTROSCOPY; GALLIUM; NANOSTRUCTURED MATERIALS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

AMORPHOUS CARBON; DIAMOND LIKE CARBON (DLC) STRUCTURE; FREE SPACE WIRINGS; PATTERN GENERATORS;

ION BEAM ASSISTED DEPOSITION;

EID: 0942289231     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1630329     Document Type: Conference Paper

References (6)

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