Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 307-313

  Bret, Tristan ^a   Utke, Ivo ^a   Hoffmann, Patrik ^a  

^a EPFL   (Switzerland)

Author keywords

Copper CVD; Electron scattering; Focused electron beam induced deposition; Micro and nanostructures; Molecular gas flow; Rapid prototyping

Indexed keywords

BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; CLOSED LOOP CONTROL SYSTEMS; ELECTRON BEAMS; ELECTRON SCATTERING; ION BEAMS; RAPID PROTOTYPING; SILICON;

COPPER CVD; FOCUSED ELECTRON BEAM INDUCED DEPOSITION; MICRO- AND NANOSTRUCTURES; MOLECULAR GAS FLOW;

NANOSTRUCTURED MATERIALS;

EID: 14944361396     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.01.007     Document Type: Conference Paper

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