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Volumn 88, Issue 12, 2006, Pages
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Electron-beam deposited SiO2 investigated by scanning capacitance microscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
DIELECTRIC MATERIALS;
MICROSCOPIC EXAMINATION;
SEMICONDUCTOR MATERIALS;
SILICON COMPOUNDS;
SPECTROSCOPY;
SUBSTRATES;
CAPACITANCE VOLTAGE MEASUREMENTS;
SCANNING CAPACITANCE MICROSCOPY;
SEMICONDUCTOR PROTOTYPING APPLICATIONS;
TOTAL OXIDE CHARGES;
ELECTRON BEAMS;
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EID: 33645500640
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2189030 Document Type: Article |
Times cited : (8)
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References (13)
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