Generation mechanism and in situ growth behavior of α-iron nanocrystals by electron beam induced deposition

Advanced Engineering Materials

Volumn 8, Issue 8, 2006, Pages 711-714

  Zhang, Wei ^a   Shimojo, Masayuki ^b   Takeguchi, Masaki ^a   Che, Ren Chao ^a   Furuya, Kazuo ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DEPOSITION; ELECTROMAGNETIC WAVE SCATTERING; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRONS;

INELASTIC SCATTERING; IRRADIATION TIME; PRIMARY ELECTRONS (PE); THRESHOLD ENERGY;

NANOSTRUCTURED MATERIALS;

EID: 33748519865     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200600026     Document Type: Article

References (13)

1. I. Utke, J. Michler, P. Gasser, C. Santschi, D. Laub, M. Cantoni, P. A. Buffat, C. Jiao, P. Hoffmann, Adv. Eng. Mater. 2005, 7, 323.
2. N. Silvis-Cividjian, C. W. Hagen, P. Kruit, M. A. J. v. d. Stam, H. B. Groen, Appl. Phys. Lett. 2003, 82, 3514.
3. H. W. P. Koops, J. Kretz, M. Rudolph, M. Weber, G. Dahm, K. L. Lee, Jpn. J. Appl. Phys. 1994, 33, 7099.
4. M. Shimojo, M. Takeguchi, M. Tanaka, K. Mitsuishi, K. Furuya, Appl. Phys. A 2004, 79, 1869.
5. O. Rubner, V. Engel, Chem. Phys. Lett. 1998, 293, 485.
6. H. W. P. Koops, A. Kaya, M. Weber, J. Vac. Sci. Technol. B 1995, 13, 2400.
7. L. Reimer, Scanning Electron Microsc. Springer-Verlag, Berlin Heidelberg 1998.
8. T. Bret, Physico-Chem. Study of the Focused Electron Beam Induced Deposition Process, Thesis, EPFL, Switzerland 2005.
9. M. Weber, J. Phys. D: Appl. Phys. 1994, 27, 1363.
10. K. E. Lewis, D. M. Golden, G. P. Smith, J. Am. Chem. Soc. 1984, 106, 3905.
11. D. L. Huber, Small 2005, 1, 482.
12. R. R. Kunz, T. M. Mayer, J. Vac. Sci. Technol. B 1988, 6, 1557.
13. D. P. Adams, L. L. Tedder, T. M. Mayer, B. S. Swartzentruber, E. Chason, Phys. Rev. Lett. 1995, 74, 5088.