Gas assisted etching of copper with focused ion beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3058-3062

  Edinger, K ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033267072     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590954     Document Type: Article

References (16)

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