Mechanics of hydrogenated amorphous carbon deposits from electron-beam-induced deposition of a paraffin precursor

Journal of Applied Physics

Volumn 98, Issue 1, 2005, Pages

  Ding, W ^a   Dikin, D A ^a   Chen, X ^a   Piner, R D ^a   Ruoff, R S ^a   Zussman, E ^a,c   Wang, X ^b   Li, X ^b  

^a Northwestern University   (United States)

^b University of South Carolina   (United States)

^c TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; HYDROCARBON MOLECULES; PARAFFIN PRECURSORS; PHOTOMASKS;

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON BEAMS; ENERGY DISSIPATION; HYDROGENATION; PARAFFINS; POLYACRYLATES; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS MATERIALS;

EID: 22944478665     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1940138     Document Type: Article

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