Ultimate sized nano-dots formed by electron beam-induced deposition using an ultrahigh vacuum transmission electron microscope

Surface and Interface Analysis

Volumn 37, Issue 2, 2005, Pages 261-264

  Tanaka, M ^a   Shimojo, M ^a,b   Han, M ^a   Mitsuishi, K ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electron beam; Induced deposition (EBID); Nano dot; STEM; TEM; W(CO)6

Indexed keywords

DEPOSITION; GOLD; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; ULTRAHIGH VACUUM;

ELECTRON BEAM INDUCED DEPOSITION (EBID); NANO-DOTS; SCANNING TRANSMISSION ELECTRON MICROSCOPY (STEM); W(CO)6;

ELECTRON BEAMS;

EID: 13244291557     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1978     Document Type: Conference Paper

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