Transient temperature measurements of resist heating using nanothermocouples

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2985-2989

  Chu, Dachen ^a   Wong, Wai Kin ^a,b   Goodson, Kenneth E ^c   Pease, R Fabian W ^a  

^a STANFORD UNIVERSITY   (United States)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; ELECTRON IRRADIATION; GREEN'S FUNCTION; MASKS; MULTILAYERS; PHOTORESISTS; QUARTZ; SEEBECK EFFECT; TEMPERATURE MEASUREMENT; THERMAL CONDUCTIVITY; THIN FILMS;

PHOTOMASK FABRICATION; RESIST HEATING; THIN FILM THERMOCOUPLES (TFTC);

THERMOCOUPLES;

EID: 0942300027     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1624255     Document Type: Conference Paper

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