A nanoscale three-dimensional Monte Carlo simulation of electron-beam-induced deposition with gas dynamics

Nanotechnology

Volumn 18, Issue 26, 2007, Pages

  Smith, D A ^a   Fowlkes, J D ^a   Rack, P D ^a  

^a University of Tennessee Knoxville   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DEPOSITION; ELECTRON BEAMS; MONTE CARLO METHODS; REACTION RATES; THREE DIMENSIONAL;

BEAM ENERGY; PILLAR GROWTH; SURFACE COVERAGE;

GAS DYNAMICS;

TUNGSTEN;

ARTICLE; CHEMICAL STRUCTURE; COMPUTER SIMULATION; ELECTRON BEAM; LIGHT SCATTERING; MOLECULAR DYNAMICS; MOLECULAR INTERACTION; MONTE CARLO METHOD; NANOANALYSIS; NORMAL DISTRIBUTION; PRIORITY JOURNAL; PROBABILITY; STRUCTURE ANALYSIS; SURFACE PROPERTY;

EID: 34250175820     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/26/265308     Document Type: Article

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