Damage-free mask repair using electron beam induced chemical reactions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 375-384

  Liang, Ted ^a   Stivers, Alan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Electron beam induced etch and deposition; EUV lithography; EUVL mask; Mask repair

Indexed keywords

ELECTRON BEAMS; ETCHING; IMAGE QUALITY; ION BEAMS; PHASE SHIFT; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

FOCUSED ION BEAMS (FIB);

MASKS;

EID: 0036378866     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472312     Document Type: Conference Paper

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