Custom design of optical-grade thin films of silicon oxide by direct-write electron-beam-induced deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2755-2760

  Wanzenboeck, Heinz D ^a   Fischer, Markus ^a   Svagera, Robert ^a   Wernisch, Johann ^a   Bertagnolli, Emmerich ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRON BEAMS; GRADIENT INDEX OPTICS; SURFACE ROUGHNESS;

DIRECT-WRITE METHOD; LATERAL CONFINED LAYERS; TRANSPARENT FILMS;

THIN FILMS;

EID: 33845275394     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2393245     Document Type: Article

References (8)

1. W. F. van Dorp, B. van Someren, C. W. Hagen, and P. Kruit, Nano Lett. 5, 1303 (2005).
2. J. Sellmair, K. Edinger, and H. W. P. Koops, J. Vac. Sci. Technol. B 23, 781 (2005).
3. G. Boero, Appl. Phys. Lett. 86, 042503 (2005).
4. T. Bret, I. Utke, A. Bachmann, and P. Hoffmann, Appl. Phys. Lett. 83, 4005 (2003).
5. I. Utke, P. Hoffmann, B. Dwir, K. Leifer, E. Kapon, and P. Doppelt, J. Vac. Sci. Technol. B 18, 3168 (2000).
6. I. Utke, A. Luisier, P. Hoffmann, D. Laub, and A. P. Buffat, Appl. Phys. Lett. 81, 3245 (2002).
7. T. Yasuda, M. Nishizawa, and S. Yamasaki, J. Appl. Phys. 90, 3887 (2001).
8. S. Lipp, L. Frey, C. Lehrer, E. Demm, S. Paulthner, and H. Ryssel, J. Vac. Sci. Technol. B 14, 3920 (1996).