Comparison of beam-induced deposition using ion microprobe

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 25-31

  Park, Y K ^a   Nagai, T ^a   Takai, M ^a   Lehrer, C ^b   Frey, L ^b   Ryssel, H ^b  

^a OSAKA UNIVERSITY   (Japan)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

Beam induced deposition; Dual beam; Electron beam (EB); Focused ion beam (FIB); Micro RBS; RBS mapping image

Indexed keywords

ADSORPTION; BERYLLIUM; CARBON; DECOMPOSITION; ELECTRON BEAMS; ELECTRON IRRADIATION; GALLIUM; ION BEAMS; ION BOMBARDMENT; PLATINUM; RADIATION EFFECTS; SILICON;

BEAM INDUCED DEPOSITION; FOCUSED ION BEAM TECHNIQUE; ION MICROPROBE;

DEPOSITION;

EID: 0033513926     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00812-X     Document Type: Article

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