Cell wall cutting tool and nano-net fabrication by FIB-CVD for subcellular operations and analysis

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1642-1645

  Kometani, Reo ^a,b,c   Funabiki, Ryoko ^b   Hoshino, Takayuki ^b,c,d   Kanda, Kazuhiro ^a,b   Haruyama, Yuichi ^a,b   Kaito, Takashi ^e   Fujita, Jun ichi ^b,f   Ochiai, Yukinori ^b,g   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c JAPAN SOCIETY FOR THE PROMOTION OF SCIENCE   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

^e SII NANOTECHNOLOGY INC   (Japan)

^f UNIVERSITY OF TSUKUBA   (Japan)

^g NEC CORPORATION   (Japan)

Author keywords

Bio nano tool; Cell wall; Focused ion beam chemical vapor deposition; Organelle; Three dimensional structure

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CUTTING TOOLS; FABRICATION; ION BEAM ASSISTED DEPOSITION; OPTIMIZATION;

BIO NANO TOOL; CELL WALL; FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION (FIB-CVD); ORGANELLE;

NANOSTRUCTURED MATERIALS;

EID: 33748278963     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.217     Document Type: Article

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