Resolution in new nanofabrication technique combining electron-beam-induced deposition and low-energy ion milling

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5627-5630

  Mitsuishi, Kazutaka ^a   Shimojo, Masayuki ^b   Tanaka, Miyoko ^a   Takeguchi, Masaki ^a   Furuya, Kazuo ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electron beam induced deposition; Ion beam milling; Nanofabrication

Indexed keywords

DEPOSITION; MASKS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY;

ELECTRON-BEAM-INDUCED DEPOSITION; ION-BEAM MILLING;

ELECTRON BEAMS;

EID: 31844432863     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5627     Document Type: Article

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