Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

Chemical Vapor Deposition

Volumn 7, Issue 1, 2001, Pages 33-37

  Ohta, Taisuke ^a   Cicoira, Fabio ^a   Doppelt, Pascal ^b   Beitone, Lionel ^b   Hoffmann, Patrik ^a  

^a EPFL   (Switzerland)

^b CNRS   (France)

Author keywords

CAS 107 46 0 (HMDSO); CAS 13939 06 5 (Mo(CO)6); CAS 14876 98 3 ( (PF3)2RhCl 2); CAS 63470 53 1 (Me2Au(tfa)); CAS 63470 54 2 (Me2Au(hfa)); Electron beam induced deposition (EBID)

Indexed keywords

EID: 0012747730     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200101)7:1<33::AID-CVDE33>3.0.CO;2-Y     Document Type: Article

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