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Volumn 25, Issue 6, 2007, Pages 2175-2179

Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; FOCUSED ION BEAMS; GALLIUM; INDIUM PHOSPHIDE; INDUCTIVELY COUPLED PLASMA; IODINE; RAPID PROTOTYPING; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

EID: 37149000009     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804607     Document Type: Article
Times cited : (16)

References (15)
  • 9
    • 0001091051 scopus 로고
    • 0022-3727 10.1088/0022-3727/7/17/318
    • R. F. C. Farrow, J. Phys. D 0022-3727 10.1088/0022-3727/7/17/318 7, 2436 (1974).
    • (1974) J. Phys. D , vol.7 , pp. 2436
    • Farrow, R.F.C.1
  • 10
    • 0036496457 scopus 로고    scopus 로고
    • 0268-1242 10.1088/0268-1242/17/3/309
    • J. S. Yu and Y. T. Lee, Semicond. Sci. Technol. 0268-1242 10.1088/0268-1242/17/3/309 17, 230 (2002).
    • (2002) Semicond. Sci. Technol. , vol.17 , pp. 230
    • Yu, J.S.1    Lee, Y.T.2
  • 12
    • 37149004733 scopus 로고    scopus 로고
    • J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985); www.srim.org.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.