Fabrication of conductive wires by electron-beam-induced deposition

Nanotechnology

Volumn 9, Issue 2, 1998, Pages 108-112

  Hiroshima, Hiroshi ^a   Komuro, Masanori ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE MATERIALS; DEPOSITION; ELECTRON BEAMS; ELECTRON EMISSION; IRRADIATION; MOLECULES; NANOTECHNOLOGY; SCANNING;

CONDUCTIVE WIRES; ELECTRON BEAM INDUCED DEPOSITION; ELECTRON BEAM LINE SCANNING; ELECTRON IRRADIATION; RATE EQUATIONS;

ELECTRIC WIRE;

EID: 0032091433     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/9/2/012     Document Type: Article

References (7)

1. Hiroshima H et al 1995 J. Vac. Sci. Technol. B 13 2514
2. Komuro M and Hiroshima H 1997 Microcirc. Eng. 35 273
3. Koops H W P et al 1988 J. Vac. Sci. Technol. B 6 477
4. Komuro M, Watanabe N and Hiroshima H 1990 Japan. J. Appl. Phys. 10 2288
5. Koops H W P et al 1995 J. Vac. Sci. Technol. B 13 2400
6. Kohlmann K T et al 1993 J. Vac. Sci. Technol. B 11 2219
7. Kanaya K and Ono S 1982 Electron Beam Interactions With Solids (Chigago, IL: Scanning Electron Microscopy, Inc.) p 69