Fabrication of 5 nm gap pillar electrodes by electron-beam Pt deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages

  Gazzadi, Gian Carlo ^a   Frabboni, Stefano ^b  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; ELECTRON BEAMS; SCANNING ELECTRON MICROSCOPY;

DIFFRACTION RINGS; GAP PILLAR ELECTRODES; NANOELECTRODES;

ELECTRODES;

EID: 29044441336     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1872015     Document Type: Conference Paper

References (18)

1. F. G. Pikus and K. K. Likharev, Appl. Phys. Lett. 71, 3661 (1997).
2. H. Kawaura, T. Sakamoto, and T. Baba, Appl. Phys. Lett. 76, 3810 (2000).
3. J. Gimzewski, Phys. World 11, 29 (1998).
4. D. Porath, A. Bezryadin, S. de Vries, and C. Dekker, Nature (London) 403, 635 (2000).
5. A. N. Broers, IBM J. Res. Dev. 32, 502 (1988).
6. J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett. 68, 1297 (1996).
7. E. Di Fabrizio, L. Grella, M. Baciocchi, M. Gentili, C. Ascoli, B. Cappella, C. Frediani, and P. Morales, J. Vac. Sci. Technol. B 15, 2892 (1997).
8. T. Miyazaki, K. Kobayashi, T. Horiuchi, H. Yamada, and K. Matsushige, Jpn. J. Appl. Phys., Part 1 40, 4365 (2001).
9. J. M. van Ruitenbeek, A. Alvarez, I. Pineyro, C. Grahmann, P. Joyez, M. H. Devroet, D. Esteve, and C. Urbina, Rev. Sci. Instrum. 67, 108 (1996).
10. A. F. Morpurgo, C. M. Marcus, and D. B. Robinson, Appl. Phys. Lett. 74, 2084 (1999).
11. S. Matsui and K. Mori, J. Vac. Sci. Technol. B 0734-211X 10.1116/1. 583317 4, 299 (1986); A. D. Dubner and A. Wagner, J. Vac. Sci. Technol. B 0734-211X 7, 1950 (1989); R. J. Young and J. Puretz, J. Vac. Sci. Technol. B 13, 2576 (1995).
12. S. Matsui and K. Mori, J. Vac. Sci. Technol. B 0734-211X 10.1116/1. 583317 4, 299 (1986); A. D. Dubner and A. Wagner, J. Vac. Sci. Technol. B 0734-211X 7, 1950 (1989); R. J. Young and J. Puretz, J. Vac. Sci. Technol. B 13, 2576 (1995).
13. S. Matsui and K. Mori, J. Vac. Sci. Technol. B 0734-211X 10.1116/1. 583317 4, 299 (1986); A. D. Dubner and A. Wagner, J. Vac. Sci. Technol. B 0734-211X 7, 1950 (1989); R. J. Young and J. Puretz, J. Vac. Sci. Technol. B 13, 2576 (1995).
14. T. Ichihashi and S. Matsui, J. Vac. Sci. Technol. B 6, 1869 (1988).
15. T. Bret, I. Utke, A. Bachmann, and P. Hoffmann, Appl. Phys. Lett. 83, 4005 (2003).
16. S. Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda, and Y. Haruyama, J. Vac. Sci. Technol. B 18, 3181 (2000).
17. A. Bezryadin and C. Dekker, J. Vac. Sci. Technol. B 15, 793 (1997).
18. K. Edinger, T. Gotszalk, and I. W. Rangelow, J. Vac. Sci. Technol. B 19, 2856 (2001).