Modeling of focused ion beam induced chemistry and comparison with experimental data

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 263-268

  Edinger, Klaus ^a   Kraus, Thomas ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; DIFFUSION; ETCHING; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; MATHEMATICAL MODELS; SILICON; SURFACE CHEMISTRY;

GAS ASSISTED ETCHING (GAE);

ION BEAMS;

EID: 0035450389     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00487-7     Document Type: Article

References (16)