Bulk micromachining of silicon using electron-beam-induced carbonaceous nanomasking

Nanotechnology

Volumn 17, Issue 21, 2006, Pages 5363-5366

  Djenizian, T ^a   Salhi, B ^b,c   Boukherroub, R ^b,c   Schmuki, P ^d  

^a AIX MARSEILLE UNIVERSITY   (France)

^b CNRS   (France)

^c INSTITUT D ELECTRONIQUE   (France)

^d UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRON BEAMS; ETCHING; MASKS; MICROMACHINING; NANOSTRUCTURED MATERIALS; THIN FILMS;

ALKALINE SOLUTIONS; NANOMASKING; POTASSIUM HYDROXIDE;

SEMICONDUCTING SILICON;

EID: 33846096818     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/21/013     Document Type: Article

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