Electron-beam-assisted etching of CrO x films by CCl 2

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 1, 2005, Pages 206-209

  Wang, S ^a   Sun, Y M ^a   White, J M ^a   Stivers, A ^b   Liang, T ^b  

^a The University of Texas at Austin   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-BEAM-ASSISTED ETCHING; GAS PRESSURE;

AUGER ELECTRON SPECTROSCOPY; CHLORINE COMPOUNDS; CHROMIUM COMPOUNDS; ELECTRON BEAMS; SILICON; THIN FILMS;

ETCHING;

EID: 24644486811     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1848107     Document Type: Article

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