Factors affecting resolution in scanning electron beam induced patterning of surface adsorption layers

Applied Physics Letters

Volumn 72, Issue 3, 1998, Pages 341-343

  Hui, Frank Y C ^a   Eres, Gyula ^a   Joy, David C ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COMPUTER SIMULATION; DESORPTION; ELECTRON ENERGY LOSS SPECTROSCOPY; HYDROGEN; MONTE CARLO METHODS; SEMICONDUCTOR DEVICE STRUCTURES; SUBSTRATES; SURFACES; TRANSMISSION ELECTRON MICROSCOPY;

SCANNING AUGER ELECTRON MICROPROBE ANALYSIS; SCANNING ELECTRON BEAM LITHOGRAPHY; TETRAMETHYL AMMONIUM HYDROXIDE SOLUTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031647851     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120730     Document Type: Article

References (14)

1. R. C. Tiberio, H. G. Craighead, M. Lercel, T. Lau, C. W. Sheen, and D. L. Allara, Appl. Phys. Lett. 62, 476 (1993).
2. F. Carcenac, C. Vieu, A. M. Haghiri-Gosnet, G. Simon, M. Mejias, and H. Launois, J. Vac. Sci. Technol. B 14, 4283 (1996).
3. S. Matsui, Y. Ochiai, M. Baba, and H. Watanabe, in Nanolithography: A borderland between STM, EB, IB, and X-Ray Lithographies, edited by M. Gentili et al. (Kluwer, Dordrecht, 1994).
4. J. W. Lyding, T. C. Shen, J. S. Hubacek, J. R. Tucker, and G. C. Abeln, Appl. Phys. Lett. 64, 2010 (1994).
5. D. P. Adams, T. M. Mayer, and B. S. Swartzentruber, J. Vac. Sci. Technol. B 14, 1642 (1996).
6. E. S. Snow and P. M. Campbell, Appl. Phys. Lett. 64, 1932 (1994).
7. K. Masu and K. Tsubouchi, J. Vac. Sci. Technol. B 12, 3270 (1994).
8. F. Y. C. Hui and Gyula Eres, Mater. Res. Soc. Symp. Proc. 448, 57 (1997).
9. J. W. Lyding, G. C. Abeln, T. C. Shen, C. Wang, and J. R. Tucker, J. Vac. Sci. Technol. B 12, 3735 (1994).
10. P. Fay, R. T. Brockenbrough, G. Abeln, P. Scott, S. Agarwala, I. Adesida, and J. W. Lyding, J. Appl. Phys. 75, 7545 (1994).
11. J. I. Goldstein, D. E. Newbury, P. Echlin, D. C. Joy, A. D. Romig, Jr., C. E. Lyman, C. Fiori, and E. Lifshin, Scanning Electron Microscopy and X-ray Microanalysis: A Text for Biologists, Materials Scientists, and Geologists, 2nd ed. (Plenum, New York, 1992), p. 88.
12. D. C. Joy, Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford University Press, Oxford, 1995).
13. A. N. Broers, W. W. Molzen, J. J. Cuomo, and N. D. Wittels, Appl. Phys. Lett. 29, 596 (1976).
14. M. A. Stevens Kalceff and M. R. Phillips, J. Appl. Phys. 77, 4125 (1994).