Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition

Journal of Microscopy

Volumn 214, Issue 1, 2004, Pages 76-79

  Shimojo, M ^a,b   Mitsuishi, K ^a   Tanaka, M ^a   Han, M ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electron beam induced deposition; Electron microscope; Metal organic gas; Nanofabrication; Quantum device; Tungsten carbonyl

Indexed keywords

DEPOSITION; ELECTRON BEAMS; ELECTRONS; FABRICATION; NANOTECHNOLOGY; ORGANOMETALLICS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON BEAM-INDUCED DEPOSITION; LINE-WIDTH; METAL-ORGANIC GAS; METALORGANICS; NANOMETRES; ORGANIC GAS; QUANTUM DEVICE; SCANNING TRANSMISSION ELECTRON MICROSCOPES; TRANSMISSION ELECTRON; TUNGSTEN CARBONYLS;

TUNGSTEN COMPOUNDS;

CARBONYL DERIVATIVE; METAL; ORGANIC COMPOUND; TUNGSTEN DERIVATIVE;

ARTICLE; DEVICE; ELECTRIC POTENTIAL; ELECTRON BEAM; ELECTRON MICROSCOPE; FIELD EMISSION; GAS; IMAGE ANALYSIS; IMAGE DISPLAY; IMAGE QUALITY; NANOTECHNOLOGY; PRIORITY JOURNAL; QUANTUM MECHANICS; SCANNING TRANSMISSION ELECTRON MICROSCOPY; THREE DIMENSIONAL IMAGING;

EID: 1842610969     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.0022-2720.2004.01307.x     Document Type: Article

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