Metal delocalization and surface decoration in direct-write nanolithography by electron beam induced deposition

Applied Physics Letters

Volumn 85, Issue 1, 2004, Pages 49-51

  Gopal, Vidyut ^a   Stach, Eric A ^a   Radmilovic, Velimir R ^a   Mowat, Ian A ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM INDUCED DEPOSITION (EBID); METAL DELOCALIZATION; NANOCIRCUITS; SURFACE DECORATION;

COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRON BEAMS; ENERGY DISPERSIVE SPECTROSCOPY; LEAKAGE CURRENTS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

NANOTECHNOLOGY;

EID: 3242664527     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1765736     Document Type: Article

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